Naosuke Nishimura

Nanoimprint system development and status for high-volume semiconductor manufacturing

Naosuke Nishimura, Yukio Takabayashi, Jin Choi, 2016, SPIE Advanced Lithography.

Experimental evaluation of particulate contamination on backside of EUV reticle

Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, 2009, Advanced Lithography.

Study of system performance in SFET

Naosuke Nishimura, Gaku Takahashi, Hideki Morishima, 2008, SPIE Advanced Lithography.

Analysis of a relation between the spatial frequency of electrostatic chuck and induced mask inplane distortion (IPD)

Kazuya Ota, Naosuke Nishimura, Shin'ichi Warisawa, 2009, Advanced Lithography.