Andre Mayer

Residual-free imprint for sensor definition

Andre Mayer, N. Bogdanski, Saskia Möllenbeck, 2009, European Mask and Lithography Conference.

Thermal nanoimprint (T-NIL) with photoresists for hybrid lithography

Andre Mayer, Saskia Möllenbeck, Hella-Christin Scheer, 2011, European Mask and Lithography Conference.

Positive or negative tone resist for a T-NIL/UVL hybrid process

Andre Mayer, Saskia Möllenbeck, Hella-Christin Scheer, 2010, European Mask and Lithography Conference.

A Novel Approach for Development of Neural Network based Electrical Machine Models for HEV System-level Design Optimization

Oliver Nelles, Andre Mayer, Josef Kallo, 2019, VEHITS.

A novel tool for frequency assisted thermal nanoimprint (T-NIL)

Andre Mayer, Saskia Möllenbeck, Hella-Christin Scheer, 2012, European Mask and Lithography Conference.

Challenges with high aspect ratio nanoimprint

Andre Mayer, Hella-Christin Scheer, Si Wang, 2014 .

Room‐Temperature Stimulated Emission and Lasing in Recrystallized Cesium Lead Bromide Perovskite Thin Films

Andre Mayer, Hella-Christin Scheer, Wolfgang Kowalsky, 2019, Advanced materials.