Keiichi Murayama

Phase measurement system with transmitted UV light for phase-shifting mask inspection

Nobuyuki Yoshioka, Hiroaki Morimoto, Katsuhiro Tsukamoto, 1994, Photomask and Next Generation Lithography Mask Technology.

Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO, and MoSiON film

Kunihiro Hosono, Nobuyuki Yoshioka, Hiroaki Morimoto, 1994, Advanced Lithography.