S. Hwang

Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition

K. Koga, M. Shiratani, N. Itagaki, 2020 .

Comparison between Ar+CH4 cathode and anode coupling chemical vapor depositions of hydrogenated amorphous carbon films

K. Koga, M. Shiratani, N. Itagaki, 2021, Thin Solid Films.

Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method

Jun‐Seok Oh, K. Koga, M. Shiratani, 2020, Processes.

Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

K. Koga, M. Shiratani, N. Itagaki, 2020, Japanese Journal of Applied Physics.

Influence of Heat Treatment on Corrosion Resistance of Sn/Mg Films Formed by PVD Method on Hot-Dip Galvanized Steel

Myeong-hoon Lee, Seung-Hyo Lee, S. Hwang, 2023, Coatings.

Raman spectral analysis of the as-deposited a-C:H films prepared by CH4 + Ar plasma CVD

Jun‐Seok Oh, K. Koga, M. Shiratani, 2022, MRS Advances.

Improved luminescence performance of Yb3+-Er3+-Zn2+: Y2O3 phosphor and its application to solar cells

K. Koga, M. Shiratani, N. Itagaki, 2022, Optical Materials.