Tetsu Takemura

Development of Sn-fueled high-power DPP EUV source for enabling HVM

Takahiro Inoue, Tomonao Hosokai, Hiroto Sato, 2007, SPIE Advanced Lithography.

High-repetition-rate MPC generator-driven capillary Z-pinch EUV source

Koichi Toyoda, Hiroto Sato, Takahiro Shirai, 2004, SPIE Advanced Lithography.

High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma

Koichi Toyoda, Hiroto Sato, Takahiro Shirai, 2005, SPIE Advanced Lithography.

Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM

Hiroto Sato, Takahiro Shirai, Kazuaki Hotta, 2006, SPIE Advanced Lithography.