Guillaume Landie

Negative-tone imaging (NTI) at the 22nm node: process and material development

Shinichiro Kawakami, Karen Petrillo, Shannon Dunn, 2011, Advanced Lithography.

Insertion strategy for EUV lithography

Lei Sun, Ming He, Scott Halle, 2012, Advanced Lithography.

Optimization of pitch-split double patterning phoresist for applications at the 16nm node

Scott Halle, Sen Liu, Shinichiro Kawakami, 2011, 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.

Enabling the 14nm node contact patterning using advanced RET solutions

James Word, Alexander Tritchkov, Vincent Farys, 2015, European Mask and Lithography Conference.

Assessment of negative tone development challenges

Alan C. Thomas, Sohan Singh Mehta, Jerome Wandell, 2012, Other Conferences.