C. Pavelescu

发表

Management of idiopathic retroperitoneal fibrosis from the urologist’s perspective

C. Gîngu, C. Surcel, C. Mirvald, 2015 .

High frequency C-V investigation of metal-oxide-semiconductor capacitors prepared by low temperature subatmospheric pressure chemical vapour deposition of SiO2 films on silicon substrates

K. Saraswat, J. McVittie, J. Leong, 1992 .

Etch rate behaviour of SiO2 films chemically vapour deposited from silane, oxygen and nitrogen gas mixtures at low temperatures

C. Cobianu, E. Segal, C. Pavelescu, 1984 .

A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 Films

C. Cobianu, C. Pavelescu, 1983 .

An Infrared Absorption Study of LTCVD Silicon Dioxide

A. Vancu, C. Cobianu, C. Pavelescu, 1983 .

Surgical management of urachal tumors: Can the umbilicus be sparred in localized disease?

M. Álvarez-Maestro, I. Sinescu, C. Surcel, 2019, Rare tumors.

Chemical foundations in understanding the step coverage problem in chemical vapour deposition using silane chemistry

C. Pavelescu, 1992 .

Analysis of the linear regime of thermal oxidation of silicon in dry oxygen at atmospheric pressure and correlation with film properties

C. Cobianu, C. Pavelescu, 1986 .

Breakdown of SiO2 thin films grown in dry O2

O. Popa, C. Pavelescu, M. Badila, 1990 .

D.c. dielectric breakdown in insulating films grown at low temperature on GaAs substrates

I. Kleps, C. Pavelescu, 1991 .

D.c. dielectric breakdown in phosphosilicate glass films prepared by low temperature chemical vapour deposition

C. Pavelescu, D. Serghi, 1990 .

Early radical cystectomy or bladder sparing therapy in high-risk patients with non-muscle invasive bladder cancer

A. Iordache, I. Sinescu, C. Gîngu, 2013 .

Activation energies in chemical vapour deposition kinetics of SiO2 films using TEOS chemistry

I. Kleps, C. Pavelescu, 1990 .

Thermodynamic investigations of the gas phase reaction of SiH4 and O2 at atmospheric pressure

C. Cobianu, C. Pavelescu, F. Segal, 1986 .

Efficiency of the SiH4 oxidation reaction in chemical vapour deposition of SiO2 films at low temperature

C. Cobianu, C. Pavelescu, 1983 .

A mechanism for the surface reaction between silane and oxygen at low temperature and correlations with the properties of the deposited SiO2 films

C. Cobianu, C. Pavelescu, 1988 .

On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition

C. Cobianu, E. Segal, C. Pavelescu, 1987 .

A fitting analysis of dry O2 atmospheric pressure silicon oxidation data and correlations with film properties

C. Cobianu, M. Bercu, C. Pavelescu, 1985 .