Vibhu Jindal

发表

Applications of advanced metrology techniques for the characterization of extreme ultraviolet mask blank defects

Jenah Harris-Jones, Emilio Stinzianni, Chihcheng Lin, 2013 .

EUV mask defects and their removal

Vibhu Jindal, Abbas Rastegar, 2012, European Mask and Lithography Conference.

Modeling the ion beam target interaction to reduce defects generated by ion beam deposition

Vibhu Jindal, David N Ruzic, Patrick Kearney, 2012, Advanced Lithography.

Dependence of contamination rates on key parameters in EUV optics

Eric M. Gullikson, Vibhu Jindal, Yu-Jen Fan, 2011, Advanced Lithography.

Defect printability studies at SEMATECH

Sungmin Huh, Vibhu Jindal, Ranganath Teki, 2013, Photomask and Next Generation Lithography Mask Technology.

Origin of EUV mask blank defects from ion beam deposition

Vibhu Jindal, Hu Yu, David N Ruzic, 2012, Advanced Lithography.

Actinic review of EUV masks: Status and recent results of the AIMS EUV system

Vibhu Jindal, Anthony Garetto, Renzo Capelli, 2015, Advanced Lithography.

Developing particle detection test bench for vacuum components

Vibhu Jindal, Henry Herbol, Gregory Denbeaux, 2012, Advanced Lithography.

Enabling inspection solutions for future mask technologies through the development of massively parallel E-Beam inspection

Stefan Wurm, Vibhu Jindal, Jan Hendrik Peters, 2015, European Mask and Lithography Conference.

Wavelength dependence of carbon contamination on mirrors with different capping layers

Vibhu Jindal, Yu-Jen Fan, Leonid Yankulin, 2010, Advanced Lithography.

Defect printability comparing actinic printing with advanced simulation for EUV masks

Sungmin Huh, Vibhu Jindal, Ranganath Teki, 2013, Advanced Lithography.

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Kenneth A. Goldberg, Iacopo Mochi, Thomas V. Pistor, 2015, Advanced Lithography.

Advanced metrology techniques for the characterization of EUV mask blank defects

Jenah Harris-Jones, Emilio Stinzianni, Vibhu Jindal, 2012, European Mask and Lithography Conference.

Investigating printability of native defects on EUV mask blanks through simulations and experiments

Jenah Harris-Jones, Vibhu Jindal, Henry Herbol, 2014, Advanced Lithography.

Evaluating vacuum components for particle performance for EUV lithography

Vibhu Jindal, Gregory Denbeaux, Yashdeep Khopkar, 2014, Advanced Lithography.

Smoothing of substrate pits using ion beam deposition for EUV lithography

Jenah Harris-Jones, Vibhu Jindal, Ranganath Teki, 2012, Advanced Lithography.

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Kenneth A. Goldberg, Iacopo Mochi, Thomas V. Pistor, 2015 .

Application of phase shift focus monitor in EUVL process control

Sudhar Raghunathan, Iacopo Mochi, Vibhu Jindal, 2013, Advanced Lithography.

Particle transport in plasma systems for development of EUVL mask blanks

Vibhu Jindal, Patrick Kearney, Peter Stoltz, 2012, Photomask Technology.

Understanding the ion beam in EUV mask blank production

Vibhu Jindal, Frank Goodwin, David N Ruzic, 2012, Advanced Lithography.

A simulation study of cleaning induced EUV reflectivity loss mechanisms on mask blanks

Jenah Harris-Jones, Vibhu Jindal, Frank Goodwin, 2012, Advanced Lithography.

Assumptions and trade-offs of extreme ultraviolet optics contamination modeling

Vibhu Jindal, Rashi Garg, Andrea Wüest, 2009, Advanced Lithography.

Plasma-assisted cleaning by metastable-atom neutralization (PACMAN): a plasma approach to cleanliness in lithography

Vibhu Jindal, David N Ruzic, Daniel Andruczyk, 2011, Advanced Lithography.

Mechanism of large area dislocation defect reduction in GaN layers on AlN∕Si (111) by substrate engineering

Vibhu Jindal, James R. Grandusky, Neeraj Tripathi, 2007 .

Native blank defect analysis for the study of printability

Kenneth A. Goldberg, Sungmin Huh, Iacopo Mochi, 2010 .

Development of strain reduced GaN on Si "111… by substrate engineering

Vibhu Jindal, James R. Grandusky, Muhammad Arif, 2005 .

Identification of important growth parameters for the development of high quality Alx>0.5Ga1−xN grown by metal organic chemical vapor deposition

Vibhu Jindal, James R. Grandusky, Neeraj Tripathi, 2007 .

Inspecting mask defects with through-focus scanning optical microscopy

Vibhu Jindal, Ravikiran Attota, 2013 .

Overview of Mask Metrology

Bryan J. Rice, Jenah Harris-Jones, Vibhu Jindal, 2011 .

Development of III-nitride nanostructures by metal-organic chemical vapor deposition

Vibhu Jindal, 2008 .

Simulation study of cleaning induced extreme ultraviolet reflectivity loss mechanisms on mask blanks

Vibhu Jindal, Frank Goodwin, Gregory Denbeaux, 2012 .