Pei-Hung Chen

Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Wenge Yang, Chih-Ming Ke, Tsai-Sheng Gau, 2003, SPIE Advanced Lithography.

Effect of various ArF resist shrinkage amplitudes on CD bias

Takashi Iizumi, Burn Jeng Lin, Chih-Ming Ke, 2002, SPIE Advanced Lithography.

Thin film 193nm TNK measurement using multi-domain genetic algorithm (MDGA) with a combination of beam profile reflectometry (BPR), absolute ellipsometry (AE), and spectroscopic ellipsometry (SE)

Chih-Ming Ke, Pei-Hung Chen, Jeng-Horng Chen, 2003, SPIE Optics + Photonics.

Evaluation of Operational Man-Machine Mix Regional Wave Forecasting System – The Role of In-Situ Wave Predictors

Pei-Hung Chen, Hwa Chien, Ming-Yang Liao, 2005 .