Matt St. John

Building block modular OPC recipes for productivity improvement in modern IC manufacturing flows

Xiaohui Chen, Jinyin Wan, Tom Wang, 2016, 2016 China Semiconductor Technology International Conference (CSTIC).

Building block style recipes for productivity improvement in OPC, RET and ILT flows

Kevin Lucas, Xiaohui Chen, Tom Cecil, 2016, SPIE Advanced Lithography.

Comparing traditional OPC to field-based OPC for 45-nm node production

Kevin Lucas, Robert Lugg, Josh Tuttle, 2007, SPIE Advanced Lithography.

Mask process effect aware OPC modeling

Munhoe Do, Robert Lugg, Sooryong Lee, 2008, Photomask Japan.

Addressing optical proximity correction challenges from highly nonlinear models

Amyn Poonawala, Stephen Jang, Yunqiang Zhang, 2017, Advanced Lithography.

Improvement in process window aware OPC

Robert Lugg, Yasushi Kojima, Sooryong Lee, 2010, Advanced Lithography.

Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning

Kuen-Yu Tsai, Matt St. John, Chien-Lin Lee, 2019, Advanced Lithography.