Travis E. Brist

Minimizing yield-loss risks through post-OPC verification

Ching-Heng Wang, Qingwei Liu, Shumay Shang, 2006, SPIE Photomask Technology.

Effective multicutline QUASAR illumination optimization for SRAM and logic

George E. Bailey, Travis E. Brist, 2003, SPIE Advanced Lithography.

Integrating RET and mask manufacturability in designs for local interconnect for sub-100-nm trenches

Nishrin Kachwala, Travis E. Brist, Rick S. Farnbach, 2004, SPIE Photomask Technology.

Reticle process effects on OPC models

George E. Bailey, Travis E. Brist, 2002, SPIE Advanced Lithography.

OPC applications into embedded-OPC designs

George E. Bailey, Travis E. Brist, 2002, SPIE Advanced Lithography.

Model-assisted placement of subresolution assist features: experimental results

Travis E. Brist, Juan Andres Torres, 2003, SPIE Advanced Lithography.