Yutaka Kodera

发表

Exploring probability of shallow ML defect impact to defect assurance

Noriaki Takagi, Yo Sakata, Shinji Akima, 2013, Photomask and Next Generation Lithography Mask Technology.

Defect printability and inspection capability for tri-tone PSM

Kunihiro Hosono, Yasutaka Kikuchi, Koji Goto, 2003, Photomask Japan.

Impact of the OMOG substrate on 32 nm mask OPC inspectability, defect sensitivity, and mask design rule restrictions

Emily Gallagher, Mark Lawliss, Karen D. Badger, 2008, Photomask Technology.

Shadow Moire Profilometry using Phase Shifting Method

Toru Yoshizawa, Yukitoshi Otani, Lianhua Jin, 1999 .

Evaluation of non-actinic EUV mask inspection and defect printability on multiple EUV mask absorbers

Kazunori Seki, Emily Gallagher, Toshio Konishi, 2013, Photomask and Next Generation Lithography Mask Technology.

Novel EUV mask black border and its impact on wafer imaging

Norihito Fukugami, Toshio Konishi, Shingo Maruyama, 2016, SPIE Advanced Lithography.

EUV mask with advanced hybrid black border suppressing EUV and DUV OOB light reflection

Norihito Fukugami, Toshio Konishi, Toru Komizo, 2018, Photomask Japan.

Shadow moire profilometry using a phase-shifting method

Toru Yoshizawa, Yukitoshi Otani, Lianhua Jin, 1999, Other Conferences.

Wafer plane inspection evaluated for photomask production

Hongqin Zhang, Emily Gallagher, Mark Lawliss, 2008, Photomask Technology.

Shadow moireprofilometry using the phase-shifting method

Toru Yoshizawa, Yukitoshi Otani, Lianhua Jin, 2000 .

Black border with etched multilayer on EUV mask

Takeshi Isogawa, Shinpei Kondo, Norihito Fukugami, 2012, Other Conferences.

Phase defect printability and mask inspection capability of 65nm technology node Alt-PSM for ArF lithography

Shinji Akima, Tooru Komizo, Yutaka Kodera, 2004 .

Flatness measurement by a UV moire technique

Toru Yoshizawa, Yukitoshi Otani, Yutaka Kodera, 1998, Optics & Photonics.

Novel EUV mask black border suppressing EUV and DUV OoB light reflection

Norihito Fukugami, Toshio Konishi, Shingo Maruyama, 2016, Photomask Japan.

Impact of transmitted and reflected light inspection on mask inspectability, defect sensitivity, and mask design rule restrictions

Yasutaka Kikuchi, Emily Gallagher, Hidehiro Ikeda, 2007, Photomask Japan.

Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis

Norihito Fukugami, Yo Sakata, Erik Verduijn, 2015, Other Conferences.

Achievements and challenges of EUV mask imaging

Guido Schiffelers, Shinpei Kondo, Norihito Fukugami, 2014, Photomask and Next Generation Lithography Mask Technology.

Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)

Shinji Akima, Tooru Komizo, Yutaka Kodera, 2004, SPIE Photomask Technology.

Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond

Guido Schiffelers, Shinpei Kondo, Norihito Fukugami, 2014, European Mask and Lithography Conference.

Minimizing "Tone Reversal" during 19x nm mask inspection

Takeshi Isogawa, Kazunori Seki, Toshio Konishi, 2018, Photomask Japan.

The study of relationship between defect sensitivity and inspectability on EUV masks with 19x nm mask inspection

Takeshi Isogawa, Karen Badger, Shinji Akima, 2019, Photomask Japan.

Reflecting on inspectability and wafer printability of multiple EUV mask absorbers

Kazunori Seki, Emily Gallagher, Toshio Konishi, 2013, Photomask Technology.

Novel programmed defect mask blanks for ML defect understanding and characterization

Kazuaki Matsui, Yutaka Kodera, Takagi Noriaki, 2012, Other Conferences.

Experimental approach to EUV imaging enhancement by mask absorber height optimization

Norihito Fukugami, Brid Connolly, Natalia Davydova, 2013, Other Conferences.

Reflecting on inspectability and wafer printability of EUV mask absorbers

Kazunori Seki, Emily Gallagher, Gregory McIntyre, 2013 .