Sören Berg

发表

COMPUTER SIMULATIONS OF SCHOTTKY CONTACTS WITH A NON-CONSTANT RECOMBINATION VELOCITY

Siegfried Selberherr, Ferenc Masszi, Jo Nylander, 1989 .

Serial magnetron co-sputtering: Sputtering yield amplification and process modelling

Matthias Wuttig, Andreas Pflug, Sören Berg, 2011 .

Position sensitive electron muliplier detector

Sören Berg, B Gelin, R Olaison, 1978 .

Channel multiplier structures by sputtering

Pa Tove, Sören Berg, Lp Andersson, 1970 .

T-DYN Monte Carlo simulations applied to ion assisted thin film processes

Sören Berg, Jp Biersack, C Nender, 1991 .

A time-resolved optical system for spatial characterization of the carrier distribution in a gate turn-off thyristor (GTO)

E. Nordlander, H Bleichner, M Rosling, 1990 .

Controlled topography production - True 3D simulation and experiment

Sören Berg, Ilia Katardjiev, Lars Jonsson, 1995 .

Basic studies of the RIBE process applied to the MOS gate spacer technology

Sören Berg, Hans-Olof Blom, Am Barklund, 1990 .

A new self aligned asymmetric lateral bipolar transistor

Jörgen Olsson, Sören Berg, Anders Söderbärg, 1996 .

A physical model for eliminating instabilities in reactive sputtering

Sören Berg, C Nender, H. Blom, 1988 .

Titanium silicide films prepared by reactive sputtering

Mikael Östling, Sören Berg, Hans-Olof Blom, 1985 .

Modeling of reactive sputtering of compound materials

Sören Berg, C Nender, Hans-Olof Blom, 1987 .

A comparative study of the diffusion barrier properties of TiN and ZrN

Mikael Östling, Sören Berg, Hans Norström, 1986 .

Predicting thin‐film stoichiometry in reactive sputtering

Sören Berg, C Nender, Hans-Olof Blom, 1988 .

Control of reactive sputtering process using two reactive gases

Sören Berg, Tomas Nyberg, D. J. Christie, 2003 .

High rate reactive magnetron sputter deposition of titanium oxide

Sören Berg, Tomas Kubart, Tomas Nyberg, 2008 .

Modelling of bias sputter deposition processes

Sören Berg, Ilia Katardjiev, 1994 .

A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Koen Strijckmans, Sören Berg, Tomas Nyberg, 2013 .

Microloading effect in reactive ion etching

Sören Berg, Christer Hedlund, Hans-Olof Blom, 1994 .

Dynamic Behaviour of the Reactive Sputtering Process

Sören Berg, Tomas Kubart, Tomas Nyberg, 2006 .

Reactively sputtered ZrN used as an Al/Si diffusion barrier in a Zr contact to silicon

Mikael Östling, Sören Berg, Hans Norström, 1984 .

Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

Sören Berg, Tomas Kubart, Tomas Nyberg, 2008 .

Method for the determination of the angular dependence during dry etching

Carola Strandman, Ylva Bäcklund, Sören Berg, 1995 .

Process modeling of reactive sputtering

Sören Berg, C Nender, Hans-Olof Blom, 1989 .

Three-dimensional simulation of surface evolution during growth and erosion

Sören Berg, Ilia Katardjiev, G. Carter, 1994 .

Influence of the target composition on reactively sputtered titanium oxide films

Jens Jensen, Sören Berg, Tomas Kubart, 2009 .

Structural and electroacoustic studies of AlN thin films during low temperature radio frequency sputter deposition

Sören Berg, Ilia Katardjiev, Gonzalo Fuentes Iriarte, 2001 .

A study of turn-off limitations and failure mechanisms of GTO thyristors by means of 2-D time-resolved optical measurements

E. Nordlander, H Bleichner, M Rosling, 1992 .

Angular dependence of the polysilicon etch rate during dry etching in SF6 and Cl2

Sören Berg, Ilia Katardjiev, Christer Hedlund, 1997 .

Dynamic simulations of pulsed reactive sputtering processes

Sören Berg, Tomas Nyberg, S. Berg, 2000 .

Upgrading the “Berg-model” for reactive sputtering processes

Sören Berg, Tomas Nyberg, Erik Särhammar, 2014 .