N. Khalfaoui

发表

Track formation in two amorphous insulators, vitreous silica and diamond like carbon: Experimental observations and description by the inelastic thermal spike model

J. Perrière, J. Stoquert, C. Dufour, 2012 .

Reply to ``Comment on `Dense and nanometric electronic excitations induced by swift heavy ions in an ionic CaF 2 crystal: Evidence for two thresholds of damage creation' ''

C. Trautmann, F. Gourbilleau, E. Jacquet, 2012 .

Experimental determination of track cross-section in Gd3Ga5O12 and comparison to the inelastic thermal spike model applied to several materials

F. Studer, J. Stoquert, J. Costantini, 2005 .

Data consistencies of swift heavy ion induced damage creation in yttrium iron garnet analyzed by different techniques

C. Trautmann, J. Grob, M. Toulemonde, 2016 .

Characterization of swift heavy ion tracks in CaF2 by scanning force and transmission electron microscopy

C. Trautmann, J. Stoquert, J. Jensen, 2005 .

Damage creation threshold of Al2O3 under swift heavy ion irradiation

M. Toulemonde, A. Meftah, J. Stoquert, 2012 .

Electronic sputtering of Gd3Ga5O12 and Y3Fe5O12 garnets: Yield, stoichiometry and comparison to track formation

C. Trautmann, W. Assmann, F. Studer, 2011 .

Study of swift heavy ion tracks on crystalline quartz surfaces

E. Jacquet, M. Toulemonde, H. Lebius, 2003 .

Neutral atom sputtering yields from Gd3Ga5O12 and Y3Fe5O12 garnets: Observation of a velocity effect

M. Beuve, S. Schlutig, J. Stoquert, 2003 .

Sputtering of vitreous SiO2 and Y3Fe5O12 in the electronic stopping power region: A thermal spike description

M. Toulemonde, A. Meftah, M. Djebara, 1998 .

Thermal spike model applied to the irradiated yttrium iron garnet: Mean diffusion length of the energy deposited on the electrons

F. Studer, J. Stoquert, J. Costantini, 1997 .

Latent tracks in CaF2 studied with atomic force microscopy in air and in vacuum

M. Schleberger, H. Lebius, N. Khalfaoui, 2006 .

Thermal Spike Description of the Damage Creation in Y3Al5O12 Induced by Swift Heavy Ions

F. Studer, J. Stoquert, M. Toulemonde, 1997 .

Influence of temperature and hydrogen rate on silicon incorporation in silica films by reactive magnetron co-sputtering

F. Gourbilleau, C. Dufour, J. Vicens, 2005 .