Seh-Jin Park

TaN-based EUV mask absorber etch study

Ki-Ho Baik, Yan Du, Pei-Yang Yan, 2006, Photomask Japan.

Phase-shifting effect of thin-absorber EUV masks

Naoya Hayashi, Hiroyoshi Tanabe, Manish Chandhok, 2011, Photomask Technology.

Direct phase-shift measurement of thin and thick absorber EUV masks

Naoya Hayashi, Eric M. Gullikson, Hiroyoshi Tanabe, 2012, Other Conferences.

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Eric Hendrickx, Gian F. Lorusso, Jan Hermans, 2009, Advanced Lithography.

Direct phase-shift measurement of an EUV mask with gradient absorber thickness

Naoya Hayashi, Eric M. Gullikson, Hiroyoshi Tanabe, 2013, Photomask Technology.

Pattern placement correction due to bending in EUVL masks

Fabian C. Martinez, Alan R. Stivers, Seh-Jin Park, 2008, Photomask Technology.