Martin Burkhardt

BEOL lithography for early development at the 65-nm node

Qiang Wu, Wenjie Li, Ronald DellaGuardia, 2004, SPIE Advanced Lithography.

Clear sub-resolution assist features for EUV

Martin Burkhardt, Ralph Schlief, Greg McIntyre, 2014, Advanced Lithography.

Fabrication technology and measurement of coupled quantum dot devices

Martin Burkhardt, 1995 .

Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

Nelson Felix, Ravi Bonam, Mary Breton, 2020 .