Seok-Ha Lee

Effect of low temperature deuterium annealing on plasma process induced damage

B. Kang, K. Hess, J. Lyding, 1999, 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395).

Application of the deuterium sintering process to improve the device design rule in reducing plasma induced damages

K. Hess, J. Lyding, K. Cheng, 1999, International Symposium on Plasma Process-Induced Damage.

Synthesis, characteristics, and field emission of doped and de-doped polypyrrole, polyaniline, poly(3,4-ethylenedioxythiophene) nanotubes and nanowires

J. Joo, D. Park, B. H. Kim, 2005 .