Christopher Cork

Calibrating OPC models using asymmetric structures

Qiliang Yan, Laurent Depre, Christopher Cork, 2006, SPIE Advanced Lithography.

Ensuring production-worthy OPC recipes using large test structure arrays

Christopher Cork, Xin Mei, Rainer Zimmermann, 2007, SPIE Advanced Lithography.

Comparison of triple-patterning decomposition algorithms using aperiodic tiling patterns

Christopher Cork, Jean-Christophe Madre, Levi D. Barnes, 2008, Photomask Japan.

An investigation into scalability and compliance for triple patterning with stitches for metal 1 at the 14nm node

Christopher Cork, Alexander Miloslavsky, Gerry Luk-Pat, 2013, Advanced Lithography.

Large-scale double-patterning compliant layouts for DP engine and design rule development

Christopher Cork, Kevin Lucas, Levi D. Barnes, 2009, Advanced Lithography.

Implementing and validating double patterning in 22-nm to 16-nm product design and patterning flows

Christopher Cork, Kevin Lucas, Beom-Seok Seo, 2010, Advanced Lithography.