Alexander R. Trimble

Patterning of hyperbranched resist materials by e-beam

Marie Angelopoulos, David R. Medeiros, Jean M. J. Frechet, 2000, Advanced Lithography.

Dendrimer-based chemically amplified resists for sub-100-nm lithography

Jean M. J. Frechet, Alexander R. Trimble, David C. Tully, 2000, Advanced Lithography.

Toward individually addressable nanometer-size surface pixels: ultrathin dendrimer films as resists for scanning probe lithography

Jean M. J. Frechet, Calvin F. Quate, Alexander R. Trimble, 1999, Advanced Lithography.

Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub‐100 nm Lithography

Jean M. J. Fréchet, Alexander R. Trimble, David C. Tully, 2000 .

Dendrimer‐Based Self‐Assembled Monolayers as Resists for Scanning Probe Lithography

Alexander R. Trimble, C. Quate, J. Fréchet, 1999 .