J. Haskell

Channeling measurements in As‐doped Si

J. Mayer, E. Rimini, J. Haskell, 1972 .

Influence of implantation temperature and surface protection on tellurium implantation in GaAs

James S. Harris, James W. Mayer, R. D. Pashley, 1972 .

Beam Effects in the Analysis of As‐Doped Silicon by Channeling Measurements

E. Rimini, James W. Mayer, J. Mayer, 1972 .