W. Y. Cheung

Degradation of RuO2 thin films in hydrogen atmosphere at temperatures between 150 and 250 degreeC

K. Y. Tong, Emil V. Jelenkovic, W. Y. Cheung, 2003, Microelectron. Reliab..

Error Protection in the Transmission of Numerical Data

G. R. Redinbo, W. Y. Cheung, 1980, 1980 IEEE International Symposium on Electromagnetic Compatibility.