Benjamen M. Rathsack
发表
Hyesook Hong,
Mark Somervell,
Z. Mark Ma,
2002,
Photomask Japan.
Clifford L. Henderson,
C. Grant Willson,
Steven Scheer,
1999,
Advanced Lithography.
Clifford L. Henderson,
Ralph R. Dammel,
C. G. Willson,
1998,
Advanced Lithography.
C. Grant Willson,
Benjamen M. Rathsack,
Cyrus Emil Tabery,
2000,
Advanced Lithography.
Makoto Muramatsu,
Jason Sweis,
Seiji Nagahara,
2013,
Advanced Lithography.
Cheng-Bai Xu,
C. Grant Willson,
Cyrus E. Tabery,
1999,
Photomask Technology.
Clifford L. Henderson,
Andreas Erdmann,
Ralph R. Dammel,
1998,
Advanced Lithography.
C. Grant Willson,
Cyrus E. Tabery,
David R. Medeiros,
2001,
SPIE Advanced Lithography.
C. Grant Willson,
Peter D. Buck,
Benjamen M. Rathsack,
2001,
SPIE Photomask Technology.
Mark Somervell,
Seiji Nagahara,
Takahiro Kitano,
2012,
Advanced Lithography.
C. Grant Willson,
Benjamen M. Rathsack,
Cyrus Emil Tabery,
1999,
Photomask Technology.
Benjamen M. Rathsack,
Brandon L. Peters,
B. Rathsack,
2015
.
J. Andres Torres,
Yuri Granik,
Germain Fenger,
2014,
Advanced Lithography.