Atsuko Yamaguchi

发表

Bias-free measurement of LER/LWR with low damage by CD-SEM

Atsuko Yamaguchi, Robert Steffen, Hiroki Kawada, 2006, SPIE Advanced Lithography.

Precise measurement of photoresist cross-sectional shape change caused by SEM-induced shrinkage

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2013, Advanced Lithography.

Metrology of LER: influence of line-edge roughness (LER) on transistor performance

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2004, SPIE Advanced Lithography.

Spatial signature in local overlay measurements: what CD-SEM can tell us and optical measurements can not

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2010, Advanced Lithography.

Microswelling-free negative resists for ArF excimer laser lithography utilizing acid-catalyzed intramolecular esterification

Yuko Tsuchiya, Takashi Hattori, Atsuko Yamaguchi, 1999, Advanced Lithography.

Influence of image processing on line-edge roughness in CD-SEM measurement

Atsuko Yamaguchi, Jiro Yamamoto, A. Yamaguchi, 2008, SPIE Advanced Lithography.

Concerning the influence of pattern symmetry on CD-SEM local overlay measurements for double patterning of complex shapes

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2010, Advanced Lithography.

LER as structural fluctuation of resist reaction and developer percolation

Hiroshi Fukuda, Atsuko Yamaguchi, 2002, SPIE Advanced Lithography.

From speculation to specification: a discussion on how to define the tolerance of LER/LWR and its measurement methodology

Atsuko Yamaguchi, Robert Steffen, Hiroki Kawada, 2006, SPIE Advanced Lithography.

Contact inspection of Si nanowire with SEM voltage contrast

Naoto Horiguchi, Takeyoshi Ohashi, Atsuko Yamaguchi, 2018, Advanced Lithography.

Characterization of line-edge roughness in Cu/low-k interconnect pattern

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2007, SPIE Advanced Lithography.

Three-dimensional profile extraction from CD-SEM top-view image

Atsuko Yamaguchi, Hiroki Kawada, Junichi Tanaka, 2009, Advanced Lithography.

Dissolution-rate analysis of ArF resist polymers based on the percolation model

Atsuko Yamaguchi, Seiichi Tagawa, Takeshi Ohfuji, 1998, Advanced Lithography.

Dose-focus monitor technique using a critical-dimension scanning electron microscope and its application to local variation analysis

Scott Halle, Timothy A. Brunner, Atsuko Yamaguchi, 2012 .

Variability study with CD-SEM metrology for STT-MRAM: correlation analysis between physical dimensions and electrical property of the memory element

Takeyoshi Ohashi, Atsuko Yamaguchi, Osamu Inoue, 2017, Advanced Lithography.

CD-SEM metrology of spike detection on sub-40 nm contact holes

Atsuko Yamaguchi, Yoshinori Momonoi, Matthew E. Colburn, 2010, Advanced Lithography.

Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography

Scott Halle, Atsuko Yamaguchi, Shunsuke Koshihara, 2014, Advanced Lithography.

Dose-focus monitor technique using CD-SEM and application to local variation analysis

Scott Halle, Timothy A. Brunner, Atsuko Yamaguchi, 2012, Advanced Lithography.

Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2011 .

Resist cluster formation model and development simulation

Atsuko Yamaguchi, Seiichi Tagawa, Takeshi Ohfuji, 1998, Advanced Lithography.

Methodology for determining critical dimension scanning electron microscope measurement condition of sub-20 nm resist patterns for 0.33 NA extreme ultraviolet lithography

Scott Halle, Atsuko Yamaguchi, Shunsuke Koshihara, 2016 .

Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

Atsuko Yamaguchi, Tadashi Arai, Daiju Shiono, 2005, SPIE Advanced Lithography.

Time-dependent simulation of acid and product distributions in chemically amplified resist

Atsuko Yamaguchi, Seiichi Tagawa, Takeshi Ohfuji, 1997, Advanced Lithography.

Correction of EB-induced shrinkage in contour measurements

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2014, Advanced Lithography.

Detection method for a T-topped profile in resist patterns by CD-SEM

Atsuko Yamaguchi, Takashi Iizumi, Hiroshi Fukuda, 2004, SPIE Advanced Lithography.

Three-dimensional profile extraction from CD-SEM image and top/bottom CD measurement by line-edge roughness analysis

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2013, Advanced Lithography.

Impact of long-period line-edge roughness (LER) on accuracy in CD measurement

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2005, SPIE Advanced Lithography.

Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2003, SPIE Advanced Lithography.

Photoresist cross-sectional shape change caused by scanning electron microscope-induced shrinkage

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2015 .

Hybrid OPC modeling with SEM contour technique for 10nm node process

Scott Halle, Atsuko Yamaguchi, Shunsuke Koshihara, 2014, Advanced Lithography.

Precise measurement of thin-film thickness in 3D-NAND device with CD-SEM

Takeyoshi Ohashi, Atsuko Yamaguchi, Masami Ikota, 2018, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Precise Cross-Sectional Measurement of Photoresist Shrinkage Caused by Electron Beam Irradiation

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2013 .

Characterization of Line-edge Roughness in Cu/low-k Interconnect Pattern

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2007 .

Evolution and Future of Critical Dimension Measurement System for Semiconductor Processes

Atsuko Yamaguchi, Maki Tanaka, Toru Ikegami, 2011 .

Single-shot method for bias-free LER/LWR evaluation with little damage

Atsuko Yamaguchi, Robert Steffen, Hiroki Kawada, 2007 .

Evaluation of line-edge roughness in Cu/low-k interconnect patterns with CD-SEM

Atsuko Yamaguchi, Hiroki Kawada, Daisuke Ryuzaki, 2009, 2009 IEEE International Interconnect Technology Conference.

Analysis of Line-edge Roughness in Resist Patterns and Its Transferability as Origins of Device Performance Degradation and Variation

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2003 .

Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance

Atsuko Yamaguchi, Daiju Shiono, Hiroshi Fukuda, 2005 .

Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists

Atsuko Yamaguchi, Daiju Shiono, Hiroshi Fukuda, 2005 .