Hiroki Kawada

发表

Bias-free measurement of LER/LWR with low damage by CD-SEM

Atsuko Yamaguchi, Robert Steffen, Hiroki Kawada, 2006, SPIE Advanced Lithography.

Precise measurement of photoresist cross-sectional shape change caused by SEM-induced shrinkage

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2013, Advanced Lithography.

Measurement of pattern roughness and local size variation using CD-SEM: current status

Takashi Kato, Hiroki Kawada, Hiroshi Fukuda, 2018, Advanced Lithography.

Metrology of LER: influence of line-edge roughness (LER) on transistor performance

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2004, SPIE Advanced Lithography.

Calibration of 25-nm pitch grating reference by high-resolution grazing incidence x-ray diffraction

Hiroki Kawada, Yoshiyasu Ito, Kazuhiko Omote, 2010, Advanced Lithography.

In-die overlay metrology by using CD-SEM

Hiroki Kawada, Takeshi Kato, Osamu Inoue, 2013, Advanced Lithography.

Evaluation of 25-nm pitch SiO2/Si multilayer grating reference using CD-SEM

Hiroki Kawada, Jiro Yamamoto, Yoshinori Nakayama, 2010, Advanced Lithography.

Key points to measure accurately an ultra-low LER by using CD-SEM

Norio Hasegawa, Hiroki Kawada, Takahiro Kawasaki, 2013, Advanced Lithography.

From speculation to specification: a discussion on how to define the tolerance of LER/LWR and its measurement methodology

Atsuko Yamaguchi, Robert Steffen, Hiroki Kawada, 2006, SPIE Advanced Lithography.

Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology

Satoru Takahashi, Kiyoshi Takamasu, Hiroki Kawada, 2014, Advanced Lithography.

Image resolution monitoring technique for CD-SEM

Hiroki Kawada, Robert Steffen, Chie Shishido, 2006, SPIE Advanced Lithography.

Characterization of line-edge roughness in Cu/low-k interconnect pattern

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2007, SPIE Advanced Lithography.

How to measure a-few-nanometer-small LER occurring in EUV lithography processed feature

Masami Ikota, Hiroki Kawada, Takahiro Kawasaki, 2018, Advanced Lithography.

Three-dimensional profile extraction from CD-SEM top-view image

Atsuko Yamaguchi, Hiroki Kawada, Junichi Tanaka, 2009, Advanced Lithography.

Sub-nanometer line width and line profile measurement for CD-SEM calibration by using STEM

Satoru Takahashi, Kiyoshi Takamasu, Hiroki Kawada, 2011, Advanced Lithography.

Sub-nanometer calibration of line width measurement and line edge detection by using STEM and sectional SEM

Satoru Takahashi, Kiyoshi Takamasu, Hiroki Kawada, 2012, Advanced Lithography.

Hybrid metrology solution for 1X node technology

Alok Vaid, Hiroki Kawada, Cornel Bozdog, 2012, Advanced Lithography.

3D-profile measurement of advanced semiconductor features by reference metrology

Yuuki Iwaki, Satoru Takahashi, Kiyoshi Takamasu, 2016, SPIE Advanced Lithography.

3D-profile measurement of advanced semiconductor features by using FIB as reference metrology

Yuuki Iwaki, Satoru Takahashi, Kiyoshi Takamasu, 2017, Advanced Lithography.

Mechanism of photoresist shrinkage investigated by single-line scan of electron beam

Takeyoshi Ohashi, Hiroki Kawada, Junichi Tanaka, 2012, Advanced Lithography.

Novel CD-SEM calibration reference consisting of 100-nm pitch grating and positional identification mark

Hiroki Kawada, Takeshi Mizuno, Yoshinori Nakayama, 2007, SPIE Advanced Lithography.

Development of accelerometer with Zero-Compliance Mechanism ( 1st report ) Principle of Measurement

Yuji Ishino, Hiroki Kawada, Masaya Takasaki, 2017 .

Sub-nanometer calibration of CD-SEM line width by using STEM

Satoru Takahashi, Kiyoshi Takamasu, Takeshi Mizuno, 2010, Advanced Lithography.

Hiroki Kawada, Takeshi Kato, Dongsub Choi, 2014 .

Novel CD-SEM magnification calibration reference of sub-50-nm pitch multi-layer grating with positional identification mark

Hiroki Kawada, Jiro Yamamoto, Yoshinori Nakayama, 2011, Advanced Lithography.

Sub-50-nm pitch size grating reference for CD-SEM magnification calibration

Hiroki Kawada, Jiro Yamamoto, Yoshinori Nakayama, 2009, Advanced Lithography.

Methodologies for evaluating CD-matching of CD-SEM

Hiroki Kawada, Chih-Ming Ke, Ya-Chun Cheng, 2009, Advanced Lithography.

Linewidth roughness of advanced semiconductor features using focused ion beam and planar-transmission electron microscope as reference metrology

Satoru Takahashi, Kiyoshi Takamasu, Masami Ikota, 2018 .

Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography

Hiroki Kawada, Burn Jeng Lin, Chih-Ming Ke, 2004, SPIE Advanced Lithography.

Line profile measurement of advanced-FinFET features by reference metrology

Yuuki Iwaki, Satoru Takahashi, Kiyoshi Takamasu, 2015, Advanced Lithography.

Correction of EB-induced shrinkage in contour measurements

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2014, Advanced Lithography.

DCM: device correlated metrology for overlay measurements

Hiroki Kawada, Takeshi Kato, Dongsub Choi, 2013, Advanced Lithography.

Three-dimensional profile extraction from CD-SEM image and top/bottom CD measurement by line-edge roughness analysis

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2013, Advanced Lithography.

Impact of long-period line-edge roughness (LER) on accuracy in CD measurement

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2005, SPIE Advanced Lithography.

Robust edge detection with considering three-dimensional sidewall feature by CD-SEM

Hiroki Kawada, Junichi Tanaka, Hajime Koyanagi, 2011, Advanced Lithography.

Influence of electron incident angle distribution on CD-SEM linewidth measurements

Hiroki Kawada, Maki Tanaka, Chie Shishido, 2006, SPIE Advanced Lithography.

ArF-resist line width slimming variation with threshold level in high precision CD-SEM measurement

Hiroki Kawada, Yuki Ojima, 2005, SPIE Advanced Lithography.

Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2003, SPIE Advanced Lithography.

Photoresist cross-sectional shape change caused by scanning electron microscope-induced shrinkage

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2015 .

Linewidth and roughness measurement of SAOP by using FIB and Planer-TEM as reference metrology

Satoru Takahashi, Kiyoshi Takamasu, Masami Ikota, 2019, Advanced Lithography.

Evaluation of line and hole measurement by high-resolution low-magnification CD SEM

Hiroki Kawada, Takashi Iizumi, Chih-Ming Ke, 2005, SPIE Advanced Lithography.

Compensation of CD-SEM image-distortion detected by View-Shift Method

Hiroki Kawada, Takahiro Kawasaki, Osamu Inoue, 2012, Advanced Lithography.

Edge determination methodology for cross-section STEM image of photoresist feature used for reference metrology

Satoru Takahashi, Kiyoshi Takamasu, Hiroki Kawada, 2013, Advanced Lithography.

CD-SEM image-distortion measured by view-shift method

Hiroki Kawada, Takahiro Kawasaki, Miyako Matsui, 2011, Advanced Lithography.

A new way of measuring wiggling pattern in SADP for 3D NAND technology

Jian Mi, Hiroki Kawada, Xiaoming Mao, 2018, Advanced Lithography.

Measurement of pattern roughness and local size variation using CD-SEM

Hiroshi Fukuda, Takashi Kato, Hiroki Kawada, 2018 .

Line-width roughness of advanced semiconductor features by using FIB and planar-TEM as reference metrology

Satoru Takahashi, Kiyoshi Takamasu, Masami Ikota, 2018, Advanced Lithography.

25 nm pitch comparison between a traceable x-ray diffractometer and a metrological atomic force microscope

Ichiko Misumi, Yasushi Azuma, Satoshi Gonda, 2011 .

Precise Cross-Sectional Measurement of Photoresist Shrinkage Caused by Electron Beam Irradiation

Takeyoshi Ohashi, Atsuko Yamaguchi, Hiroki Kawada, 2013 .

Characterization of Line-edge Roughness in Cu/low-k Interconnect Pattern

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2007 .

Single-shot method for bias-free LER/LWR evaluation with little damage

Atsuko Yamaguchi, Robert Steffen, Hiroki Kawada, 2007 .

Evaluation of line-edge roughness in Cu/low-k interconnect patterns with CD-SEM

Atsuko Yamaguchi, Hiroki Kawada, Daisuke Ryuzaki, 2009, 2009 IEEE International Interconnect Technology Conference.

Analysis of Line-edge Roughness in Resist Patterns and Its Transferability as Origins of Device Performance Degradation and Variation

Atsuko Yamaguchi, Hiroki Kawada, Takashi Iizumi, 2003 .

LER and LWR measurements used for monitoring wiggling and stochastic-failure (Conference Presentation)

Takumichi Sutani, Hiroki Kawada, Takahiro Kawasaki, 2019, Metrology, Inspection, and Process Control for Microlithography XXXIII.

Simulation of Thickness Distribution of Thin Film Grown by Molecular Beam Epitaxy

Hiroki Kawada, Kazue Takahashi, 1991 .

Critical dimension-scanning electron microscope magnification calibration with 25-nm pitch grating reference

Hiroki Kawada, Jiro Yamamoto, Yoshinori Nakayama, 2011 .

Study of Measurement Condition Optimization in Critical Dimension-Scanning Electron Microscope

Hiroki Kawada, Hiromasa Yamanashi, Yasunari Sohda, 2008 .