Nicola Murphy

13.5 nm emission from composite targets containing tin

Padraig Dunne, Emma Sokell, Patrick Hayden, 2005, SPIE Advanced Lithography.

4D inner shell excitations of I, Ba, and La in the 70-125 eV region

Gerry O'Sullivan, Lynn Gaynor, Nicola Murphy, 2005, SPIE OPTO-Ireland.

Optimizing an EUV source for 13.5 nm

Luke McKinney, Anthony Cummings, Nicola Murphy, 2004, SPIE Optics + Photonics.

The evolution of 4D photoabsorption in tellurium with increasing ionisation

Patrick Hayden, Gerry O'Sullivan, Anthony Cummings, 2005, SPIE OPTO-Ireland.

EUV laser produced plasma source development for lithography (Invited Paper)

Padraig Dunne, Gerry O'Sullivan, Patrick Hayden, 2005, SPIE OPTO-Ireland.