Gerard O'Sullivan

13.5 nm emission from composite targets containing tin

Padraig Dunne, Emma Sokell, Patrick Hayden, 2005, SPIE Advanced Lithography.

A 6.7-nm beyond EUV source as a future lithography source

Bowen Li, Takeshi Higashiguchi, Noboru Yugami, 2012, Advanced Lithography.

Generation and characterization of spatially distributed laser produced plasma extreme ultraviolet source

Gerard O'Sullivan, Fergal O'Reilly, Padraig Dunne, 2009, Lithography Asia.

Characterization of broadband emission around 40 nm from potassium plasma

Toyohiko Yatagai, Takeshi Higashiguchi, Noboru Yugami, 2011, Optical Engineering + Applications.

Laser-produced plasma UTA emission in 3-7nm spectral region

Bowen Li, Takeshi Higashiguchi, Noboru Yugami, 2012, Advanced Lithography.