Alexander Miloslavsky

Double patterning addressing imaging challenges for near- and sub-k1=0.25 node layouts

Kevin Lucas, Sung-Ho Lee, Sooryong Lee, 2009, Photomask Japan.

Mask cost reduction and yield optimization using design intent

Michael L. Rieger, Michel Luc Côté, Alexander Miloslavsky, 2005, SPIE Advanced Lithography.

An investigation into scalability and compliance for triple patterning with stitches for metal 1 at the 14nm node

Christopher Cork, Alexander Miloslavsky, Gerry Luk-Pat, 2013, Advanced Lithography.

Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows

Vincent Wiaux, Staf Verhaegen, Kevin Lucas, 2009 .

Process centering OPC using design intent to improve yield

Robert Lugg, Michael L. Rieger, Michel Luc Côté, 2005, SPIE Advanced Lithography.

Hybrid AAPSM compliance methodology to ensure design for manufacturing

Michel Luc Côté, Vishnu G. Kamat, Alexander Miloslavsky, 2004, SPIE Advanced Lithography.

Correcting lithography hot spots during physical-design implementation

Hiroaki Suzuki, Atsuhiko Ikeuchi, Suigen Kyoh, 2006, SPIE Photomask Technology.

Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography

Yuelin Du, Martin D. F. Wong, Qiang Ma, 2013, 2013 50th ACM/EDAC/IEEE Design Automation Conference (DAC).