Hemant S. Mondkar

Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography

Ki-Bum Kim, Haiwon Lee, Hyun-Mi Kim, 2014 .

Novel synthesis of 1,2,4‐triazolophanes and 1,3,4‐oxadiazolophanes: A dieckmann condensation approach

Hemant S. Mondkar, M. S. Chande, P. Barve, 2012 .

Synthesis of Novel Cryptates Based on Triazole Motif: A Regioselective Approach

Hemant S. Mondkar, S. Chandran, M. S. Chande, 2011 .

Synthesis of novel photoacid generator containing resist polymer for electron beam lithography.

Haiwon Lee, Kyunghwa Sohn, Min Jeong Kim, 2012, Journal of nanoscience and nanotechnology.