Hitoshi Nagano

Highly durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography

Hakaru Mizoguchi, Akira Sumitani, Hitoshi Tomaru, 2004, SPIE Advanced Lithography.

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Shinji Nagai, Satoshi Tanaka, Toru Suzuki, 2007, SPIE Advanced Lithography.

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Shinji Nagai, Satoshi Tanaka, Junichi Fujimoto, 2008, SPIE Advanced Lithography.

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Georg Soumagne, Akira Sumitani, Takashi Suganuma, 2011, Advanced Lithography.

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Satoshi Tanaka, Junichi Fujimoto, 2008, SPIE Advanced Lithography.

A Comparative Study for Sentiment Analysis on Election Brazilian News

Allan Kardec Barros, Hitoshi Nagano, Caio M. A. Carvalho, 2017, STIL.

Present status of laser-produced plasma EUV light source

Masaki Nakano, Akira Sumitani, Tamotsu Abe, 2010, Advanced Lithography.

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Georg Soumagne, Akira Endo, Akira Sumitani, 2011, Advanced Lithography.