Célia Nicolet

Block copolymer line roughness measurement via PSD: application to fingerprint samples

Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, 2020, Advanced Lithography.

Process highlights to enhance directed self-assembly contact patterning performances

Célia Nicolet, Christophe Navarro, Maxime Argoud, 2016 .

Evaluation of adhesion layers performances for soft UV nanoimprint lithography

Célia Nicolet, Christophe Navarro, Laurent Pain, 2019, Advanced Lithography.

Evaluation of anti-sticking layers performances for 200mm wafer scale Smart NILTM process through surface and defectivity characterizations

F. Fournel, Célia Nicolet, Christophe Navarro, 2018, Advanced Lithography.

Use of sequential infiltration synthesis to improve the pattern transfer of PS-b-PLA DSA (Conference Presentation)

Célia Nicolet, Christophe Navarro, Francesc Pérez-Murano, 2017, Advanced Lithography.

Advanced surface affinity control for DSA contact hole shrink applications

Célia Nicolet, Christophe Navarro, Maxime Argoud, 2017, Advanced Lithography.

Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers

Célia Nicolet, Christophe Navarro, Francesc Pérez-Murano, 2015 .

Nanomechanical properties of solvent cast PS and PMMA polymer blends and block co-polymers

Célia Nicolet, Christophe Navarro, Laura Evangelio, 2015, Advanced Lithography.

Optimization of the bulk heterojunction composition for enhanced photovoltaic properties: correlation between the molecular weight of the semiconducting polymer and device performance.

Célia Nicolet, Guillaume Wantz, Georges Hadziioannou, 2011, The journal of physical chemistry. B.