Christophe Navarro

发表

Block copolymer line roughness measurement via PSD: application to fingerprint samples

Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, 2020, Advanced Lithography.

Surface affinity role in graphoepitaxy of lamellar block copolymers

Christophe Navarro, Maxime Argoud, Guillaume Claveau, 2016 .

Process highlights to enhance directed self-assembly contact patterning performances

Célia Nicolet, Christophe Navarro, Maxime Argoud, 2016 .

Evaluation of adhesion layers performances for soft UV nanoimprint lithography

Célia Nicolet, Christophe Navarro, Laurent Pain, 2019, Advanced Lithography.

Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)

Christophe Navarro, Maxime Argoud, Gilles Cunge, 2013 .

Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements

Christophe Navarro, L. Pain, Christophe Couderc, 2012, Advanced Lithography.

Evaluation of anti-sticking layers performances for 200mm wafer scale Smart NILTM process through surface and defectivity characterizations

F. Fournel, Célia Nicolet, Christophe Navarro, 2018, Advanced Lithography.

Use of sequential infiltration synthesis to improve the pattern transfer of PS-b-PLA DSA (Conference Presentation)

Célia Nicolet, Christophe Navarro, Francesc Pérez-Murano, 2017, Advanced Lithography.

Advanced surface affinity control for DSA contact hole shrink applications

Célia Nicolet, Christophe Navarro, Maxime Argoud, 2017, Advanced Lithography.

Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers

Célia Nicolet, Christophe Navarro, Francesc Pérez-Murano, 2015 .

Contact holes patterning by directed self-assembly of block copolymers: process window study

Christophe Navarro, Maxime Argoud, Patricia Pimenta Barros, 2015 .

Nanomechanical properties of solvent cast PS and PMMA polymer blends and block co-polymers

Célia Nicolet, Christophe Navarro, Laura Evangelio, 2015, Advanced Lithography.

Microphase Separation of Polybutyrolactone-Based Block Copolymers with Sub-20 nm Domains

Christophe Navarro, Guillaume Fleury, D. Bourissou, 2018, Macromolecules.

Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films

Christophe Navarro, Caroline A. Ross, Georges Hadziioannou, 2015, Advanced materials.

Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study

Christophe Navarro, Laurent Pain, Raluca Tiron, 2011 .

PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication

Christophe Navarro, Maxime Argoud, Isabelle Servin, 2015 .

Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals

Christophe Navarro, Stefan Dilhaire, Georges Hadziioannou, 2013, Advanced materials.

Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X-ray Scattering: The Attractive Case of Graphoepitaxy

Christophe Navarro, Raluca Tiron, Xavier Chevalier, 2014 .

Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line

Charles Pieczulewski, Masaya Asai, Christophe Navarro, 2014 .