Roswitha Remling

Current status of 157-nm mask technology development

Giang T. Dao, Kevin J. Orvek, Fu-Chang Lo, 2000, Photomask Japan.

Focused ion beam repair of 193-nm reticle at 0.18-μm design rules

Pei-yang Yan, Roswitha Remling, 1997, Photomask Technology.

PSM defect repair using currently available tools

Roswitha Remling, 1994, Photomask Technology.

Focused ion beam phase-shift mask repair (fib or fact?)

Roswitha Remling, 1994, Photomask Technology.