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Planarization Ability of Chemical Mechanical Planarization (Cmp) Processes

Robert D. Tolles, Rahul Jairath, M. Stell, 1994 .

Consumables for the Chemical Mechanical Polishing (Cmp) of Dielectrics and Conductors

Robert D. Tolles, Rahul Jairath, M. Stell, 1994 .

Effect of Polishing Pad Material Properties on Chemical Mechanical Polishing (Cmp) Processes

Rahul Jairath, Robert Tolles, Rajeev Bajaj, 1994 .

Modelling tool for chemical-mechanical polishing design and evaluation

M. Desai, S. R. Runnels, I. Kim, 1998 .