Benjamin Cabannes-Boué

Investigation into the mechanism of photo-mediated RAFT polymerization involving the reversible photolysis of the chain-transfer agent

J. Lalevée, Qizhi Yang, F. Morlet‐Savary, 2017 .

Polymers synthesized by RAFT as versatile macrophotoinitiators

J. Lalevée, P. Xiao, F. Morlet‐Savary, 2015 .

Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers.

M. Zelsmann, G. Fleury, X. Chevalier, 2021, ACS applied materials & interfaces.

On‐Demand Editing of Surface Properties of Microstructures Made by 3D Direct Laser Writing via Photo‐Mediated RAFT Polymerization

Xing Wu, Arnaud Spangenberg, S. Gree, 2021, Advanced Functional Materials.

Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers.

G. Hadziioannou, I. Cayrefourcq, M. Zelsmann, 2021, ACS applied materials & interfaces.

Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography

M. Zelsmann, G. Fleury, C. Navarro, 2023, Nanotechnology.

Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

G. Hadziioannou, I. Cayrefourcq, M. Zelsmann, 2021, Advanced Lithography.

Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block Copolymers.

M. Zelsmann, Benjamin Cabannes-Boué, M. Panabière, 2024, ACS applied materials & interfaces.