Junichi Kosugi

Actual performance data analysis of overlay, focus, and dose control of an immersion scanner for double patterning

Yuuki Ishii, Hisashi Nishinaga, Shinji Wakamoto, 2010, Advanced Lithography.

High-productivity immersion scanner enabling 1xnm hp manufacturing

Takahisa Kikuchi, Yasuhiro Ohmura, Yuichi Shibazaki, 2013, Advanced Lithography.

Simultaneous optimization of dose and focus controls in advanced ArF immersion scanners

Daniel Kandel, John C. Robinson, Pavel Izikson, 2010, Advanced Lithography.

Process window control using CDU master

Akira Tokui, Tomoharu Fujiwara, Toshio Ohashi, 2012, Advanced Lithography.

Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

Yuichi Shibazaki, Yasuhiro Iriuchijima, Jun Ishikawa, 2010, Advanced Lithography.

Advanced CDU improvement for 22nm and below

Akira Tokui, Tomoharu Fujiwara, Junichi Kosugi, 2011, Advanced Lithography.

Practical performance and enabling technologies in immersion scanners for the double patterning generation

Shinji Sato, Yuichi Shibazaki, Jun Ishikawa, 2011, Advanced Lithography.