David W. Porter

ALD resist formed by vapor-deposited self-assembled monolayers.

S. Bent, P. McIntyre, R. Sreenivasan, 2007, Langmuir : the ACS journal of surfaces and colloids.

Area Selective Atomic Layer Deposition by Soft Lithography

S. Bent, P. McIntyre, Hyoungsub Kim, 2006 .

Tertiary amide chemistry at the Ge(1 0 0)-2 × 1 surface

Albert J. Keung, S. Bent, M. Filler, 2005 .

Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification

S. Bent, P. McIntyre, Hyoungsub Kim, 2005 .

Formation of surface-bound acyl groups by reaction of acyl halides on ge(100)-2x1.

Albert J. Keung, S. Bent, M. Filler, 2006, The journal of physical chemistry. B.