Carsten Hartig

Combined process window monitoring for critical features

Bernd Schulz, Boris Habets, Stefan Buhl, 2017, Advanced Lithography.

Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope

Peter Ebersbach, Charles N. Archie, Alok Vaid, 2011 .

Practical aspects of TMU based analysis for scatterometry model referencing

Adam Urbanowicz, Alok Vaid, Daniel Fischer, 2017 .

Implementation of hybrid metrology at HVM fab for 20nm and beyond

Alok Vaid, John Taylor, Cornel Bozdog, 2013, Advanced Lithography.

Practical aspects of TMU based analysis for scatterometry model referencing

Alok Vaid, Carsten Hartig, Robert Melzer, 2017, 2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO).

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Peter Ebersbach, Alok Vaid, Cornel Bozdog, 2011, Advanced Lithography.