Yoshikazu Teranishi

发表

Analysis of oxidation behavior under dry air of neat and Ta‐alloyed furan‐resin‐derived carbons heat treated at 3000 °C

M. Kakihana, N. Suzuki, M. Fukushima, 2005 .

Raman characterization of oxidation behavior of free carbon in silicon oxycarbide ceramics

M. Fukushima, Y. Tanabe, E. Yasuda, 2004 .

Cluster SIMS using metal cluster complex ions

H. Itoh, H. Nonaka, S. Ichimura, 2008 .

Characteristics of a cluster‐ion beam of Os3(CO)n+ (n = 7 or 8) for low‐damage sputtering

H. Nonaka, S. Ichimura, A. Kurokawa, 2006 .

Oxidation Behavior of Si–Nb–C–O Ceramics Prepared by the Pyrolysis of Methyltriethoxysilane Based Organic-Inorganic Hybrid Gel

M. Fukushima, M. Shimizu, Yoshiyuki Nakamura, 2005 .

Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

H. Komiya, Tetsuhide Shimizu, M. Yang, 2015 .

A.c. voltammetric evidence for the transient adsorption of asymmetric ions in the transfer across the nitrobenzene-water interface

T. Kakiuchi, Y. Teranishi, Yoshikazu Teranishi, 2001 .

Growth Rate and Electrochemical Properties of Boron-Doped Diamond Films Prepared by Hot-Filament Chemical Vapor Deposition Methods

Tetsuhide Shimizu, Yuriko Kondo, Y. Teranishi, 2016 .

Effect of Ca or Mg ion irradiation on the bioactivity and strength of hydroxyapatite

Satoshi Kobayashi, Yoshimi Ohyabu, Y. Teranishi, 2018 .