Ian M. Mcmackin

Advanced prototyping using: Step-and-flash imprint

S. V. Sreenivasan, David Tar-Wei Wang, Tom Rafferty, 2005 .

Using reverse-tone bilayer etch in ultraviolet nanoimprint lithography

S. V. Sreenivasan, Nick Stacey, David Tar-Wei Wang, 2005, MICRO 2005.

Cleaning of step-and-flash imprint masks with damage-free nonacid technology

Uwe Dietze, Peter Dress, Douglas J. Resnick, 2010 .