M. Hibbs

发表

Effects of substrate temperature and substrate material on the structure of reactively sputtered TiN films

U. Helmersson, B. Johansson, J. Sundgren, 1984 .

The microstructure of reactively sputtered Ti-N films

B. Johansson, J. Sundgren, B. Jacobson, 1983 .

The effect of oxygen and substrate temperature on the growth of Ti thin films on stainless‐steel substrates

U. Helmersson, J. Sundgren, H. Hentzell, 1983 .

Reactively magnetron sputtered Hf‐N films. I. Composition and structure

B.-O. Johansson, Ulf Helmersson, U. Helmersson, 1985 .

The microstructure of reactively sputtered Ti-N films containing the Ti2N phase

B. Johansson, J. Sundgren, B. Jacobson, 1985 .

Compressive deformation and fracture in WC materials

R. Sinclair, D. Rowcliffe, M. Hibbs, 1988 .

Defect interactions in deformed WC

R. Sinclair, D. Rowcliffe, M. Hibbs, 1984 .

Room-temperature deformation mechanisms and the defect structure of tungsten carbide

R. Sinclair, M. Hibbs, 1981 .

The effect of oxygen on the grain boundary and void structure of titanium films

J. Sundgren, H. Hentzell, M. Hibbs, 1984 .

Structure of reactively magnetron sputtered Hf‐N films

U. Helmersson, B. Johansson, J. Sundgren, 1984 .

Defect Structure of WC Deformed at Room and High Temperatures

R. Sinclair, D. Rowcliffe, M. Hibbs, 1983 .