Eric L. Fanucchi

Mighty high-T lithography for 65-nm generation contacts

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Advanced 193 tri-tone EAPSM (9%-18%) for 65 nm node

Will Conley, Greg P. Hughes, Laurent Dieu, 2002, Photomask Technology.