Wil Pijnenburg

Mighty high-T lithography for 65-nm generation contacts

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Defect printability in CPL mask technology

Will Conley, Christopher J. Progler, Robert J. Socha, 2004, SPIE Advanced Lithography.

The impact of MEEF through pitch for 120-nm contact holes

Will Conley, Kevin D. Lucas, Robert John Socha, 2004, SPIE Advanced Lithography.