Saeed Sabouri

Corner-rounding study

Saeed Sabouri, 1993, Advanced Lithography.

Precise reticle defect classification and sizing based on double-tier inspection technique

Yair Eran, Saeed Sabouri, Meir Aloni, 1993, Advanced Lithography.

Achieving sub-half-micron i-line manufacturability through automated OPC

Eytan Barouch, Steven A. Orszag, Keith K. Chao, 1997, Advanced Lithography.

Size matters: defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability

Linard Karklin, Nigel R. Farrar, Roger F. Caldwell, 1998, Photomask Technology.