Youngjoon Kim

Characteristics of Silicon Oxide Thin Film Deposited via Remote Plasma Atomic Layer Deposition

Sung Gwon Lee, H. Jeon, S. Song, 2021 .

Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma

Suhye Park, H. Jeon, S. Song, 2019, Applied Sciences.

Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N2 plasma

C. Jin, H. Jeon, Jung Hoon Lee, 2020 .