Tim Hasselmann

A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films.

M. Nolan, T. Riedl, A. Devi, 2020, Chemical communications.

An N-Heterocyclic Carbene Based Silver Precursor for Plasma-Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure.

T. Riedl, A. Devi, S. Karle, 2018, Angewandte Chemie.

Silver Thin‐Film Electrodes Grown by Low‐Temperature Plasma‐Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure

R. Heiderhoff, T. Riedl, A. Devi, 2022, Advanced Materials Technologies.

Gas Diffusion Barriers Prepared by Spatial Atmospheric Pressure Plasma Enhanced ALD.

T. Riedl, D. Theirich, H. Gargouri, 2017, ACS applied materials & interfaces.

Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition

T. Riedl, D. Theirich, Tim Hasselmann, 2016 .

Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier

T. Riedl, D. Theirich, D. Rogalla, 2018 .