H. Ohba

Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents

S. Kubota, K. Kanomata, F. Hirose, 2015 .

Total low temperature plasma process for epitaxial growth of compound semiconductors on Si: InSb/Si

S. Yamauchi, T. Hariu, H. Ohba, 1998 .