Toru Takeda

Microcrystalline/Amorphous Thin Si Films Deposition by a Newly Developed Dual Injection System Employing Hydrogen Plasma and Silicon Radicals at Low Temperature (300 °C) Chemical Vapor Deposition Process

Tadahiro Ohmi, Masaki Hirayama, Herzl Aharoni, 2007 .

Evaluation of Hydride Reorientation Behavior and Mechanical Properties for High-Burnup Fuel-Cladding Tubes in Interim Dry Storage

Takayoshi Yasuda, Toshikazu Baba, Katsuichiro Kamimura, 2008 .