T. Hori

In situ observation of a high-temperature Si(001) surface during SiH2Cl2 exposure by photoelectron spectroscopy

H. Kato, Y. Takakuwa, N. Miyamoto, 1999 .

First-order isothermal desorption kinetics of chlorine on SiH2Cl2-adsorbed Si(100) surface

Y. Takakuwa, N. Miyamoto, H. Sakamoto, 1994 .

Kinetics of dissociative adsorption of dichlorosilane on Si(100)2 × 1

M. Suemitsu, Y. Takakuwa, N. Miyamoto, 1996 .

In situ observation of thermal and photon-induced reactions on Si surfaces by ultraviolet photoelectron spectroscopy

Tetsuji Yamaguchi, H. Kato, Y. Takakuwa, 1998 .

Photoelectron intensity oscillation during chemical vapor deposition on Si(100) surface with Si2H6

M. Niwano, Tetsuji Yamaguchi, H. Kato, 1994 .

In situ monitoring of gas source molecular beam epitaxy of silicon with disilane by ultraviolet photoelectron spectroscopy

Tetsuji Yamaguchi, H. Kato, Y. Takakuwa, 1997 .