Ben Rathsack

Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials

Roel Gronheid, Junichi Kitano, Steven Scheer, 2008, SPIE Advanced Lithography.

The optimizations of resist shrink process using track-based technology

Takashi Saito, Satoru Shimura, Yoshihiro Kondo, 2010, Advanced Lithography.

Comparison of directed self-assembly integrations

Roel Gronheid, Kathleen Nafus, Paul Nealey, 2012, Other Conferences.

Image contrast contributions to immersion lithography defect formation and process yield

Eric Hendrickx, Roel Gronheid, Kathleen Nafus, 2008, SPIE Advanced Lithography.