Joseph R. Cavallaro

High-resolution microlithography applications of deep-UV excimer lasers

Miklos Erdelyi, Zsolt Bor, Joseph R. Cavallaro, 1997, International Symposium on High Power Laser Systems and Applications.

New phase-shifting method for high-resolution microlithography

Joseph R. Cavallaro, Motoi Kido, Frank K. Tittel, 1994, Advanced Lithography.

Interferometric phase shift technique for high-resolution deep-UV microlithography

Joseph R. Cavallaro, Motoi Kido, Michael C. Smayling, 1995, International Symposium on High Power Laser Systems and Applications.

Generation of zero-order Bessel beams with Fabry-Perot interferometer

Joseph R. Cavallaro, Miklos Erdelyi, Zsolt Bor, 1998, GR-I International Conference on New Laser Technologies and Applications.

Integrated CAD framework linking VLSI layout editors and process simulators

Miklos Erdelyi, Chaitali Sengupta, Zsolt Bor, 1996, Advanced Lithography.

Optical microlithography with nearly nondiffracting beams

Miklos Erdelyi, Zsolt Bor, Joseph R. Cavallaro, 1997, Advanced Lithography.

New phase-shifting technique for deep UV excimer laser based lithography

Miklos Erdelyi, Chaitali Sengupta, Zsolt Bor, 1995, Photonics West.

Sub-quarter-micrometer contact hole fabrication using annular illumination

Joseph R. Cavallaro, Miklos Erdelyi, Zsolt Bor, 1996, Advanced Lithography.